Stochastic Capacitance Extraction Considering Process Variation with Spatial Correlation

The increasing process variation and spatial correlation between process parameters makes capacitance extraction of interconnects an important yet challenging problem in modern VLSI designs. In this presentation, we will first introduce basic capacitance extraction flow follow by advance model considering process variation (E.g., orthogonal polynomial method). After that, approaches that solve the resulted augmented system will be presented, such as spectral methods based on polynomial chaos, including Galerkin and collocation methods. Experiment results will also be presented to compare the performance between these methods as well as Monte Carlo method. Finally, some potential research topics within this area will be discussed.